設備名稱 Equipment Name

管式等離子體氧化鋁淀積爐  Horizontal PECVD (AlO_x ) 

設備型號 Equipment Model

PD-520

設備用途 Equipment Application

本設備主要用于在硅片背面通過N₂O和TMA淀積氧化鋁鈍化介質膜，提高電壓和電流，然后在氧化鋁膜表面淀積氮化硅保護膜。

Deposit AlO_x passivition dielectric film on the rear side of wafers using N₂O and TMA gas to increase voltage and current of the solar cell and then deposit Si_xN_y protective film on the surface of the AlO_x film.

工藝流程 Process Flow

石墨舟及硅片準備→管內充氮氣→進舟→抽真空、壓力測試→淀積氧化鋁復合膜→抽真空、壓力測試→清管路、充氮氣→退舟

graphite boat & wafers ready→Nitrogen inlet→graphite boat load in→vacuumize, pressure test→deposit AlO_x film→vacuumize, pressure test→tube cleaning and Nitrogen inlet→graphite boat unload 

技術特點  Features

1、氧化鋁、氮氧化硅、氮化硅復合膜PERC技術。
AlO_x, SiO_xN_y and SiN_x complex layers.  

2、兼容氮化硅、氮氧化硅PERC技術。
Compatible with SiN_x and SiO_xN_y PERC process. 

3、雙水冷密封技術。
Double water-cooled sealing technology .

4、專利內加熱技術。
Patented internal heating technology.

5、高速平穩整體模組推舟機構。
High-speed integral module boat pushing mechanism.

6、懸浮承載舟技術。
Graphite boat contact-free with quartz tube.

7、自主知識產權MES軟件。
MES software with independent intellectual property right.

8、自主開發中央計算機集中控制系統。
Independently developed CCC system.

9、快速鍍膜技術。
Fast coating technology.

10、全面的防超溫、斷偶、撞舟等安全報警保護功能。
Alarm protection for over-heating, thermocouple -break and boat collision.

設備參數  Parameters